hydrofluoricacid
FH
20MT ISO tank container
Colorless transparent liquid
7664-39-3
Availability: | |
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CAS NO. | 7664-39-3 |
Alias | AHF |
Molecular Formula | FH |
Appearance | Colorless transparent liquid |
ASSAY | 99.90% Min |
Package | 20MT ISO tank container |
PackingGroup | II |
UN NO. | 1790 |
HazardClass | 8 |
Technical Data Sheet | |
HF % | ≥ 99.90 |
H2O % | ≤ 0.005 |
H2SiF6 % | ≤ 0.005 |
SO2 % | ≤ 0.002 |
H2SO4 % | ≤ 0.005 |
As ( ppm) | ≤ 5.00 |
Appearance | Colorless transparent liquid |
Methods of production | ||||
The sulfuric acid method produces anhydrous hydrofluoric acid by crude distillation, degassing, and distillation of the hydrogen fluoride generated by the decomposition of fluorite with sulfuric acid. CaF2+H2SO4 → 2HF+CaSO4 | ||||
APPLICATION | |||
Mainly used as a raw material for fluorinated compounds, as well as in the manufacturing of aluminum fluoride and cryolite, semiconductor surface etching, and as a catalyst for alkylation. Used as a strong acidic corrosive agent in the electronic industry, it can be used in combination with nitric acid, acetic acid, ammonia, and hydrogen peroxide. It is an essential source of fluorine for fluoride salts, fluoride refrigerants, fluoroplastics, fluororubber, fluoropharmaceuticals, and pesticides. | |||
CAS NO. | 7664-39-3 |
Alias | AHF |
Molecular Formula | FH |
Appearance | Colorless transparent liquid |
ASSAY | 99.90% Min |
Package | 20MT ISO tank container |
PackingGroup | II |
UN NO. | 1790 |
HazardClass | 8 |
Technical Data Sheet | |
HF % | ≥ 99.90 |
H2O % | ≤ 0.005 |
H2SiF6 % | ≤ 0.005 |
SO2 % | ≤ 0.002 |
H2SO4 % | ≤ 0.005 |
As ( ppm) | ≤ 5.00 |
Appearance | Colorless transparent liquid |
Methods of production | ||||
The sulfuric acid method produces anhydrous hydrofluoric acid by crude distillation, degassing, and distillation of the hydrogen fluoride generated by the decomposition of fluorite with sulfuric acid. CaF2+H2SO4 → 2HF+CaSO4 | ||||
APPLICATION | |||
Mainly used as a raw material for fluorinated compounds, as well as in the manufacturing of aluminum fluoride and cryolite, semiconductor surface etching, and as a catalyst for alkylation. Used as a strong acidic corrosive agent in the electronic industry, it can be used in combination with nitric acid, acetic acid, ammonia, and hydrogen peroxide. It is an essential source of fluorine for fluoride salts, fluoride refrigerants, fluoroplastics, fluororubber, fluoropharmaceuticals, and pesticides. | |||
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